INFLUENCE OF STRUCTURE OF GAS ATMOSPHERE AND RF-POWER ON
PROPERTIES OF EPITAXIAL LAYERS GROWN BY METALORGANIC CHEMICAL
VAPOR DEPOSITION

T. I. Benushis, S. N. Ershow
Nizhny Novgorod State University, Russia

L. A. Bovina, V. I. Stafeev
The State Unitary Enterprise «RD&P Center "Orion"», Moscow, Russia

          Reactor gas composition and pressure influence on properties of exitaxial layers grown by metalorganic chemical vapor deposition in RF plasma have been investigated. Better layer quality has been obtained in helium with hydrogen contamination at pressures 1-5 torrs.Optimum RF-power is a function of grown layers composition and can be determined from the ratio for saturated and unsaturated hydrocarbons concentrations at the reactor output.

Contens of the "Applied Physics" journal, 2000, N 1