Numerical simulation of the technological process

Numerical simulation of the technological process of the deposition
of thin films
in gas-discharge electron beam evaporation

V. I. Melnik, I. V. Melnik
National Technical University of Ukraine "KPI", Kiev, Ukraine

P. V. Porytsky
Institute for Nuclear Research, Kiev, Ukraine

In the present paper the numerical-analytical model of processes occurred in gas-discharge electron-beam evaporator is studied. The consistent integration of the equations describing the evaporation of metal from a surface of a crucible, its mass-transfer in volume of the chamber and its condensation on a substrate allows to calculate performances of processes depending on parameters of an electron beam.