B. N. Vasichev, E. E. Chernova-Stoljarova, L. B. Rozenfeld
Moscow State Institute of Electronics and Mathematicians (Technical University), Moscow, Russia
The opportunities of a method of the photoemissive and exoemissive check of microelectronic wares under production conditions are surveyed. The construction of equipment intended for in-process quality control of surfaces of substructures and films of microstructures in industrial semiconductor engineerings is submitted.