Applied physics
N 4, 2002

FREE   SURFACE ENERGY OF THIN POLYIMIDE FILMS UNDER THER FORMATION BY SILICON DIOXIDE  COVERING

A.A.Zhukow

Moscow Central Research Institute ” Cyclone” , Moscow, Russia

The changes of the values of free surface energy for the polyamidoacid and polyimide layers covering the silicon dioxide and prepared by the thermal imidization have been investigated by the method of wetting. It is shown, that the character of changes of free surface energy of  polyimide layers during the imidization process depends on the chemical nature of the polymer first of all: the absolute value of the free surface energy is 15% less for the imidizated  softened polyimides compared with  the N - phenylparaoxyphenylpolypyromellitimide. It is also revealed, that for the studied polyimide layers the increase of the values of free surface energy at Т= 523 - 553K is typical; this increase is caused by the surface hydrophylization.

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