Increase of efficiency of cylindrical magnetron sputtering system with a rotating cathode
A. N. Zakharov, А. А. Soloviev, N. S. Sochugov
High Current Electronics Institute SD RAS, Tomsk, Russia
The aim of the present work was increase of efficiency of cylindrical magnetron sputtering system with a rotating cathode due to extension of the area of uniform coating deposition and reduction of the rapid erosion at the end parts of the target. The design of the magnetic system with increased magnetic field at its ends and modified turn-around parts has been developed. It allows to extend the coating deposition region with the uniformity of ±1 % by 13 cm and completely eliminate rapid erosion of the end cathode parts.
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