APPLIED PHYSICS

THE SCIENTIFIC AND TECHNICAL JOURNAL


No. 5 Founded in 1994 Moscow 2003


Vacuum arc plasma source with anodic and cathodic regime of discharging

A. N. Kuznetsov, N. V. Prakhov
Bauman Moscow State Technical University, Moscow, Russia

   The following experimental data of researching vacuum arc plasma source working in heat regime with distributed electrode fixation. This device allows to working with two different regimes: either with consumed anode or consumed cathode. The parameters of discharge and electron temperature are given for both regimes. The plasma source, which is described in this article, is of interest of surface treatment technology of materials.

Contents