Peculiarities of coatings deposition by a RF plasma in dynamic vacuum
I. Sh. Abdullin, R. T. Galiaoutdinov, N. F. Kashapov
Kazan State Technological University, Kazan, Russia
Electromagnetic fields and current densities of a jet RF plasmatron are studied. The plasma jet of a RF discharge in the process of deposition represents a combined dis-charge having inductive and capacitive components, and is characterized by a sheath of a positive charge. The thin-film coatings obtained with the help of a RF plasma at low pressure are being investigated.
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