APPLIED PHYSICS
THE SCIENTIFIC AND TECHNICAL JOURNAL
No. 4 |
Founded in 1994 |
Moscow 2009 |
CONTENTS
GENERAL PHYSICS
PLASMA PHYSICS AND PLASMA TECHNOLOGIES
Kirtshaliya V. G., Minaev I. M., Rukhadze A. A., Chogovadze M. V.
About analogy of stability of tangential breaks in hydrodynamics and in collisionless nonisothermal plasma
| | 75 |
Zakharov N. S., Kholod S. V.
Influence of the processes of ionization on frequency modulated wave packets propagation in the rarefied gases
| | 81 |
Alferov D. F., Ahmetgareev M. R., Yevsin D. V., Ivanov V. P.
Quenching of an electric arc in a vacuum gap with an uniform transverse magnetic field
| | 86 |
Pashentsev V. N.
Plasma characteristics of magnetron on long distance from cathode
| | 91 |
Konstantinov V. O., Shchukin V. G., Sharafutdinov R. G., Karsten V. M., Gartvich G. G.,
Semenova O. I.
Electron-beam plasma conversion of monosilane to polycrystalline silicon
| | 95 |
Kurilenkov Yu. K.,,Tarakanov V. P.,Guskov S. Yu.
Inertial electrostatic confinement and nuclear synthesis at interelectrode media of nanosecond vacuum discharge.
Part II. PIC-simulation
| | 102 |
ELECTRON AND ION BEAMS
PHOTOELECTRONICS: ELEMENTAL BASE AND TECHNOLOGY
PHYSICAL EQUIPMENT
Contents of
the journal down to 1994
|