APPLIED PHYSICS
THE SCIENTIFIC AND TECHNICAL JOURNAL
No. 1 |
Founded in 1994 |
Moscow 1995 |
LOW POWER HIGH FREQUENCY PLASMA SOURCES
A. F. Alexandrov, S. G. Kondrashin
Moscow State University, Moscow, Russia
G. E. Bugrov, N. F. Vorobyev, E. A. Kralkina, V. A. Obuknov
Moscow Aviation Institute, Moscow, Russia
A. A. Rukhadze
General Physics Institute of Russian Academy of Sciences, Moscow, Russia
A general theory of low power plasma sources based on the method of high frequency (HF) heating and supporting of
plasma is presented. The frequency lies between the ion and electron Larmour frequencies in the longitudinal
external magnetic field parallel to the plasma stream velocity. Under such conditions all the electromagnetic
phenomenoain plasma sources are determined by the electrons. At the same time the wavelength is much larger than
the geometrical sizes of the sources and, therefore, a quaslstatic description is valid. The cylindrical and flat
sources are considered, and an example of the experimental realization of such a source is discussed.
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