Specialty of ion implantation use vacuum-arc ion source
A. M. Borisov, N. V. Borodulina, B. L. Krit, S. A. Tikhonov
MATI — Russian State Technological University, Moscow, Russia
The main feature of technological implanters with a vacuum-arc ion source is the multi-charging composition of the ion beam. The model of polyenergy high dose ionic implantation were consider in the article in predict a lateral view of allocation of introduced atoms and her comparison with experimental datas surveyed.
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