No. 1 |
Founded in 1994 |
Moscow 2004 |

The Sixth All-Russian Seminar “Problems of Theoretical and

Applied Electron and Ion Optics”

Filachev A.M.
Problems of Theoretical and Applied Electron and Ion Optics
| 5 | |

Bykovsky V.F., Meshkov I.N., Selesnev I.A., Syresin E.M.
Experiments with electron beam injection in ionosphere plasma and rare gas
| 7 | |

Il’in V.P.
Parallel algorithms of modeling the high current EOS | 14 | |

Andreev S.V., Monastyrsky M.A., Tarasov V.A., Schlev M.Ya., Greenfield D.E.
Formation of sub-femtosecond photoelectron bunches in time-dependent electric fields
| 20 | |

Greenfield D.E., Monastyrsky M.A., Tarasov V.A. . A grid photocathode free of the first-order temporal chromatic aberration
| 32 | |

Bublyaev R.A., Galeev G.A., Baranova L.A.
Studying focusing and space-time features of the new type 3-d electrostatic lenses
| 39 | |

Ovcyannikova L.P., Fishkova T.Ya
Influence of cylindrical pole sizes to parameters of high-dispersion mass-analyzer with in-homogeneous field
| 42 | |

Golikov Yu.K., Krasnova N.K., Solovjev K.V., Grigorjev D.V.
On analytical relation between axisymmetric and two-dimension Laplace’s fields
| 48 | |

Sveshnikov V.M.
Calculation of cathode area in electron-optical systems forming the intensive beams of charged particles
| 50 | |

Sveshnikov V.M.
Increasing of the accuracy of the intensive charged particle beams calculation
| 55 | |

Petrovich O.N., Stekolnikov A.F.
Simulation of influence of the electrode structure parameters and emitting plasma parameters on the characteristics of narrow electron beam
| 65 | |

BimurzaevS.B.,Yakushev E.M.
Method of a parametrization for the precise electron trajectories
| 73 | |

Eremin A.P., Smolyaninov V.D., Kozlov A.N., Uvaev A.G., Filachev A.M.
Electron-ion-plasma production equipment for manufacture of workpieces of microphotoelectronics and precise machine industry
| 77 | |

Kryuchkov V.G., Potelov V.V., Senik D.N.
Vacuum aspherization of high-precise optical elements of IR facilities
| 85 | |

Borisov A.M., Borodulina N.V., Krit B.I., Tikhonov S.A.
Speciality of ion implantation use vacuum-arc ion source
| 89 | |

Fatyanova G.I., Kulikov Yu.V.,Vasichev B.N.
Forming the light-section 100-eV electron beams in a raster-type
electron microscope
| 93 | |

Perevodchikov V.I., Shapenko V.N., Stalkov P.M., Murashov A.S.
Development of electron gates with diminished mass-dimensional parameters
| 97 | |

Krivosheev P.V., Manuilov V.N.
Influence of electric field allocation in the area of an electrostatic mirror on bombardment of the cathode by reflected electrons in gyrotrons
| 101 | |

Balebanov V.M., Erokhin N.S., Mikhailovskaya L.A.
Energy spectrum estimates for the ion-electron emission in the radioisotope battery
| 105 | |

Gagarin Yu.E., Stepovich M.A.
Some possibilities of the use of confluence analisis for an interval parameter estimation of semiconductors in cathodoluminescent microscope
| 109 | |

Zhukov A.A., Zhukov S.A., Tchetverov Yu.S., Babaevsky P.G., Shapoval S.Yu.
Polyimide coatings texture development by ECR-plasma etching
| 113 | |

Borisov S.S., Grachev E.A., Negulyaev N.N., Cheremukhin E.A., Zaitsev S.I.
Modeling the
dielectric polarization during an electron beam exposure
| 118 | |

Golikov Yu.K., Grigorjev D.V., Krasnova N.K., Solovjev K.V.
Generalization of the variables separation method in axisymmetric potential theory
| 124 |