Applied physics
No. 6, 2002

The Influence of the ion etching on parameters of the CdHgTe photoconductors

A. V. Filatov, V. I. Looksha, G. E. Popovyan, U. S. Troshkin, U. P. Sharonov
ORION Research-and-Production Association, Moscow, Russia

The influence of the ion etching was investigated at temperature of liquid nirogen on effective time of life of the ion carriers of a charge in thick (~ 1 mm) and thin (~ 0.01 mm) samples CdHgTe n-type conductivity. Is received, that use of the ion etching at cryogenic temperatures allows to lower re-combination speed on lateral sides of photoresistors and at the expense of it to increase volt sensi-tivity of classical photoresistors and time of accumulation of a signal in SPRITE receivers. The pa-rameters of photodetectors are given.

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