Electron-ion-plasma production equipment for manufacture of workpieces of microphotoelectronics and precise machine industry
A. P. Eremin, V. D. Smolyaninov, A. N. Kozlov, A. G. Uvaev
Research Institute for Electron and Ion Optics, Moscow, Russia
A. M. Filachev
ORION Research-and-Productions Association, Moscow, Russia
The special electron-ion-plasma production equipment for manufacture of workpieces of amicrophotoelectronics, microelectronics and precise machine industry is surveyed in the paper. The equipment is intended for drawing the structural thin-film coats, ion-beam etching the semiconductor materials and microwelding the workpieces in vacuum. Given are characteristics, composition and technological opportunities of equipment.
Contents