Polyimide coatings texture development by ECR-plasma etching
A. A. Zhukov, S. A. Zhukova, Yu. S. Tchetverov
CNII “Cyclon”, Moscow, Russia
P. G. Babaevsky
MATI-Tsiolkovsky Russian State University of Technology, Moscow, Russia
S. Yu. Shapoval
IPTM RAS, Tchernogolovka, Russia
Effect of chemical composition and imidization temperature of thin polyimide coatings on etching rate in oxygen plasma generated by electron cyclotron resonance source at different bias voltage potential (ion energy) and time of the process was studied. A correlation of plasmochemical etching rate and topology pattern profile for polyimide coatings at different etching conditions was determined.
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