APPLIED PHYSICS

THE SCIENTIFIC AND TECHNICAL JOURNAL


No. 1 Founded in 1994 Moscow 2004


Modeling the dielectric polarization during an electron beam exposure

S. S. Borisov, E. A. Grachev, N. N. Negulyaev, E. A. Cheremukhin
Physical Department, Moscow State University of M. V. Lomonosov, Moscow, Russia

S. I. Zaitsev
Institute of Problems of Microelectronic Technology, Russian Academy of Science, Tсhernogolovka, Moscow region, Russia

   On the basis of Monte-Carlo method a new approach to modeling of an electron interaction with a substance is offered. Some phenomena concerned with a spatial energy distribution and accumulation of a charge in an irradiated sample are considered. Calculation of distributions of electric potential and resists polarization induced by an injected charge are presented. It is shown, that charging is still the essential circumstance, capable to cause significant loss of accuracy in electron-beam lithography.

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