|No. 6||Founded in 1994||Moscow 2004|
ECR plasma source for vacuum technology
V. V. Andreev, A. A. Balmashnov, A. M. Umnov
People's Friendship University of Russia, Moscow, Russia
A system based on H0nq cavity for generation of uniform plasma of high density in the region of the treatment object of large diameter is proposed. RF electric field structure provides the possibility for microwave penetration into overdense plasma.