APPLIED PHYSICS

Optical materials in DUV lithographic projection exposure systems: the current status and tendency of development and application

V. S. Anchutkin, A. B. Belsky
"Krasnogorsky Zavod After S. A. Zvereva" JSC, Krasnogorsk, Moscow reg., Russia

   The results of comparative analysis of the current state and tendency of development and application of CaF₂ and fused silica in DUV lithographic projection exposure systems for ICs production are presented. Fused silica and its modified forms are shown to have dominated as a key optical materials and have great potentials for the purpose of creating up-to-date and perspective models of 193-nm immersion lithography systems. The tendency of CaF₂ percentage reduction in total volume of optical materials in projection lens is noted. It is achieved by using new engineering solutions and designing methods.

PACS: 81.05.-t

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