APPLIED PHYSICS

   A general theory of low power plasma sources based on the method of high frequency (HF) heating and supporting of plasma is presented. The frequency lies between the ion and electron Larmour frequencies in the longitudinal external magnetic field parallel to the plasma stream velocity. Under such conditions all the electromagnetic phenomenoain plasma sources are determined by the electrons. At the same time the wavelength is much larger than the geometrical sizes of the sources and, therefore, a quaslstatic description is valid. The cylindrical and flat sources are considered, and an example of the experimental realization of such a source is discussed.

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